Analytical model for ion angular distribution functions at rf biased surfaces with collisionless plasma sheaths
The article presents an analytical model for evaluation of ion angular distribution functions (IADFs) at a radio frequency (rf)-biased surface in a high-density plasma reactor. The model couples a unified rf sheath model to an assumed ion velocity distribution function-based formulation for determining the IADF under any general rf-bias condition. Under direct-current (dc) bias conditions the IADF
