A highly tunable lateral quantum dot realized in InGaAs/InP by an etching technique
We report on the realization of a quantum dot in a modulation doped InGaAs/InP heterostructure by electron beam lithography and chemical wet etching. Using etched trench defined in-plane gates and a local top gate, the tunneling barriers, electron density, and electrostatic potential of the dot can be tuned. Electrical measurements reveal clear Coulomb blockade behavior of the electron transport t
