Surface degradation of InxGa1-xN thin films by sputter-anneal processing: A scanning photoemission microscope study
The effects of nitrogen ion sputtering and thermal anneal processing on the surface electronic structure of the ternary III-V semiconductor In0.12Ga0.88N have been studied using scanning photoemission microscopy. No phase separation of the material is observed for annealing temperatures up to 650degreesC. However, samples annealed at 700degreesC for 5 h show clear evidence of phase separation. Fur