Metalorganic Chemical Vapor Deposition of Anatase Titanium Dioxide on Si: Modifying the Interface by Pre-Oxidation.
The formation of TiO2 films on clean and pre-oxidized Si(1 1 1) through chemical vapor deposition of titanium(IV) isopropoxide (TTIP) in ultra-high vacuum has been examined by synchrotron radiation photoelectron spectroscopy, X-ray absorption spectroscopy (XAS) and scanning tunneling microscopy. In both cases, TTIP deposition at 500 °C eventually results in an anatase TiO2 film with a carbon-free
