High-temperature thermal stability of nanocrystalline Cr2O3 films deposited on silicon wafers by arc ion plating
In this work, the high-temperature thermal stability of nanocrystalline Cr2O3 films on Si wafers deposited at various bias voltages was systematically investigated by means of a symmetrical high-resolution thermogravimetric system. In the meantime, the effects of substrate bias voltage on the morphology, microstructure, crack area percentage, phase constituents, and grain size of the heat-treated
