Formation of polyhedral voids at surface cusps during growth of epitaxial TiN/NbN superlattice and alloy films
Epitaxial TiN/NbN(001) superiattice thin films with periods A between 0 (alloy) and 9.6 nm have been grown by ultrahigh vacuum reactive magnetron sputter deposition on MgO(OOl) substrates in mixed Ar/N2 discharges. Cross-sectional transmission electron microscopy was used for characterizing layer and defect structure. Coherency strain relaxation close to the film/substrate interface resulted in no
