Scale-up Analysis of Continuous Cross-flow Atomic Layer Deposition Reactor Designs
This paper presents the development of a non-dimensional model of a continuous cross-flow atomic layer deposition (ALD) reactor with temporally separated precursor pulsing and a structured model-based methodology for scaling up the substrate dimensions. The model incorporates an ALD gas–surface reaction kinetic mechanism for the deposition of thin ZnO films from Zn(C2H5)2 and H2O precursors that w