Ti thin films deposited by high-power impulse magnetron sputtering in an industrial system: Process parameters for a low surface roughness
The influence of the choice of process parameters in an industrial high-power impulse magnetron sputtering (HiPIMS) system on the surface roughness and crystallinity of Ti coatings is presented in this work. A current density of 1 A/cm2 was kept constant by varying the pulse frequency to control the average power. The films were characterised by scanning electron microscopy, atomic force microscop